MIL-STD-1330 Precision Cleaning And Testing Of Shipboard Oxygen, Helium, Helium-Oxygen, Nitrogen, And Hydrogen SystemsThis standard provides the requirements for precision cleaning and testing of oxygen or oxygen-enriched systems and components; oxygen generating plants including nitrogen, hydrogen, and demineralized water support systems and components; and helium, helium-oxygen, and hydrogen life support systems and components. Each activity will implement the applicable requirements of this document through a locally prepared and approved procedure. Activities subject to additional quality assurance requirements such as NAVSEA SS800-AG-MAN-010/P-9290 or NAVSEA SS521-AA-MAN-010 will obtain procedure approval from the applicable certifying activity.

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MIL-STD-1330D(SH) APPENDIX D

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NOTE 21:  If an error occurs while taking a reading, such as pressing the wrong key or dropping the dish, the reading can not be repeated.  If this occurs, start over from D.10.3.3.

D.10.3.15  Repeat D.10.3.3 through D.10.3.14 until three data points (they do not have to be consecutive) are within the following acceptable range.

TABLE D-IV.  Acceptable range for 5 ppm acceptance criteria with baseline.

D.10.3.16  The average of the three acceptable data points shall be recorded in data sheet 3 as the Dish 5 ppm

Acceptance Criteria with Baseline.

D.10.3.17  At the end of the day or when D.10.3.16 is completed, mark the solvent level on the laboratory standard.

D.11  Procedure for performing analysis.  For instrument cleaning, the sample is taken in conjunction with performing the analysis as specified in D.7.  For other than instrument cleaning, the sample is taken in a container during the cleaning process.  Log all results in data sheet 4.  Results shall be retained as long as the item cleaned is in use.

D.11.1  Assign a unique control number for the analysis and log in data sheet 4.

D.11.2  Turn the SQM control unit ON.  After 15 seconds when the system boots up, set the mode to PEAK. Allow 15 minutes to warm up.  Check that the control unit gain setting is as specified in data sheet 3 for the dish that will be used for the analysis.

D.11.3  Using Sparkleen cleaning solution (D.6.2(a)) in a container (D.5.1(i)), THOROUGHLY clean the evaporating dish by scrubbing by hand using a paper towel (D.5.1(h)) for about one minute.  Rinse THOROUGHLY, for about 20 to 30 seconds, under running tap water.  Shake off excess water.

NOTE 22:  Do not touch the inside surface after cleaning and do not dry the inside surface with a towel or cloth. D.11.4  Using the washing bottle (D.5.1(d)) filled with CFC-113, HCFC-225, or HFE-7100, tilt the dish and

spray it with solvent to displace the water droplets off of the dish, particularly from the flat area at the bottom of the

evaporating area.  Droplets remaining near the top edge are acceptable.  The solvent shall be directed into a "solvent waste" container.

WARNING 4:  Thermal decomposition of solvent can cause harmful vapors.  As a check, feel the hot plate with bare hand to confirm it is "warm to the touch" prior to evaporating solvent in the dish.  If it appears too warm, determine the cause and take the necessary corrective action.

D.11.5  Place the dish on a hot plate set per D.8.1.1.  Keep the dish on the hot plate until no solvent or water droplets remain on the surfaces where evaporation occurs.  On the flat top edge and bottom, any residual water can be wiped with a clean cloth.

NOTE 23:  Accomplish the following actions as quickly as possible to minimize the time the dish is exposed to the UV light.  Since the monitor is not sensitive to the temperatures specified in this procedure, there is no need to allow the dish to cool before taking a reading.

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